International Standard
ISO 25164:2026
Physical vapor deposition coatings — Magnetron sputtering deposition of TiAlSiN thin films — Specification
Reference number
ISO 25164:2026
Edition 1
2026-08
© ISO 2026

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Published (Edition 1, 2026)

ISO 25164:2026

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Format
CHF 44
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Abstract

This document specifies the technical requirements for TiAlSiN thin films deposited by magnetron sputtering.

This document is also applicable to the deposition of TiN, TiAlN or TiSiN thin films.

General information

  • Status
     : Published
    Publication date
     : 2026-08
    Stage
    : International Standard published [60.60]
  • Edition
     : 1
    Number of pages
     : 6
  • Technical Committee :
    ISO/TC 107/SC 9
    ICS :
    25.220.40 
  • RSS updates

Life cycle

Sustainable Development Goals

This standard contributes to the following Sustainable Development Goal

9
Industry, Innovation and Infrastructure

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  4. ICS
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  6. 25.220
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