Abstract Preview

ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.

General information

  • Status :  Published
    Publication date : 2010-07
  • Edition : 2
    Number of pages : 19
  • :
    ISO/TC 201/SC 6
    Secondary ion mass spectrometry
  • 71.040.40
    Chemical analysis

Buy this standard

Format Language
  • CHF118

Life cycle

Got a question?

Check out our FAQs

Customer care
+41 22 749 08 88

Opening hours:
Monday to Friday - 09:00-12:00, 14:00-17:00 (UTC+1)

Keep up to date with ISO

Sign up to our newsletter for the latest news, views and product information.