ISO 14237:2010
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ISO 14237:2010
44882

Abstract  Preview

ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.


General information 

  •  :  Published
     : 2010-07
  •  : 2
     : 19
  •  : ISO/TC 201/SC 6 Secondary ion mass spectrometry
  •  :
    71.040.40 Chemical analysis

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