This Technical Report gives guidelines for measuring the sputtered depth in sputtered depth profiling. The methods
of sputtered depth measurement described in this Technical Report are applicable to techniques of surface
chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a
typical sputtered depth of up to severalmicrometres.
Status: WithdrawnPublication date: 2001-06
Edition: 1Number of pages: 12
Technical Committee: ISO/TC 201/SC 4 Depth profiling