ISO/DIS 8181
u
ISO/DIS 8181
82998

Abstract

This document defines the terms involved in atomic layer deposition technology and the corresponding applications. The basis of atomic layer deposition and the physical and chemical properties of thin films, as well as their detection methods are included. The terms in corresponding applications of thin films via atomic layer deposition are defined, such as microelectronics, photovoltaics, display, energy and catalysis.


General information 

  •  :  Under development
  •  : 1
     : 10
  •  : ISO/TC 107 Metallic and other inorganic coatings
  •  :
    01.040.25 Manufacturing engineering (Vocabularies)
    25.220.01 Surface treatment and coating in general

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