ISO 21859:2019 Preview

Fine ceramics (advanced ceramics, advanced technical ceramics) -- Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.


General information

  • Status :  Published
    Publication date : 2019-06
  • Edition : 1
    Number of pages : 4
  • :
    ISO/TC 206
    Fine ceramics
  • 81.060.30
    Advanced ceramics

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