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Standard and/or project under the direct responsibility of ISO/TC 201/SC 4 Secretariat Stage ICS
ISO 14606:2000
Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
95.99
ISO 14606:2015
Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
90.92
ISO/DIS 14606
Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
40.00
ISO/TR 15969:2001
Surface chemical analysis — Depth profiling — Measurement of sputtered depth
95.99
ISO/TR 15969:2021
Surface chemical analysis — Depth profiling — Measurement of sputtered depth
60.60
ISO 16531:2013
Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
95.99
ISO 16531:2020
Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
60.60
ISO 17109:2015
Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
90.92
ISO 17109:2015/DAmd 1
Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films — Amendment 1
40.98
ISO/FDIS 17109
Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
50.20
ISO/TR 22335:2007
Surface chemical analysis — Depth profiling — Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer
90.93
ISO/DIS 23170
Surface chemical analysis --- Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
40.99

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