ИСО - ISO/TC 201 - Surface chemical analysis

Подкомитет	Заголовок подкомитета	Опубликованные стандарты	Стандарты, находящиеся на стадии разработки
ISO/TC 201/SC 1	Terminology	2	3
ISO/TC 201/SC 2	General procedures	9	0
ISO/TC 201/SC 3	Data management and treatment	5	0
ISO/TC 201/SC 4	Depth profiling	5	3
ISO/TC 201/SC 6	Secondary ion mass spectrometry	11	2
ISO/TC 201/SC 7	Electron spectroscopies	23	2
ISO/TC 201/SC 8	Glow discharge spectroscopy	5	1
ISO/TC 201/SC 9	Scanning probe microscopy	7	2
ISO/TC 201/SC 10	X-ray Reflectometry (XRR) and X-ray Fluorescence (XRF) Analysis	1	0

Фильтр:
Опубликованные стандарты
Стандарты, находящиеся на стадии разработки
Отмененные стандарты
Удаленные проекты

Стандарт и/или проект находящийся в компетенции ISO/TC 201 Секретариата	Этап	ICS
ISO 14706:2000 Surface chemical analysis — Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy	95.99	71.040.40
ISO 14706:2014 Surface chemical analysis — Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy	90.93	71.040.40
ISO 16413:2013 Evaluation of thickness, density and interface width of thin films by X-ray reflectometry — Instrumental requirements, alignment and positioning, data collection, data analysis and reporting	95.99	35.240.70 71.040.40
ISO 16413:2020 Evaluation of thickness, density and interface width of thin films by X-ray reflectometry — Instrumental requirements, alignment and positioning, data collection, data analysis and reporting	60.60	35.240.70 71.040.40
ISO 17331:2004 Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy	90.93	71.040.40
ISO 17331:2004/Amd 1:2010 Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy — Amendment 1	60.60	71.040.40
ISO 18337:2015 Surface chemical analysis — Surface characterization — Measurement of the lateral resolution of a confocal fluorescence microscope	90.60	71.040.40
ISO/TS 18507:2015 Surface chemical analysis — Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis	90.93	71.040.40
ISO/TR 19693:2018 Surface chemical analysis — Characterization of functional glass substrates for biosensing applications	60.60	71.040.40
ISO/CD 23124 Surface Chemical Analysis — Measurement of lateral and axial resolutions of Raman microscope	30.20	71.040.40
ISO/DIS 24465 Surface chemical analysis — Determination of the minimum detectability of Surface Plasmon Resonance device	40.20	71.040.40

По запросу ничего не найдено. Пожалуйста, попробуйте изменить настройки фильтра.