ИСО - ISO/TC 201/SC 4 - Depth profiling

Фильтр:
Опубликованные стандарты
Стандарты, находящиеся на стадии разработки
Отмененные стандарты
Удаленные проекты

Стандарт и/или проект находящийся в компетенции ISO/TC 201/SC 4 Секретариата	Этап	ICS
ISO 14606:2000 Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials	95.99	71.040.40
ISO 14606:2015 Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials	90.20	71.040.40
ISO/TR 15969:2001 Surface chemical analysis — Depth profiling — Measurement of sputtered depth	90.92	71.040.40
ISO/PRF TR 15969 Surface chemical analysis — Depth profiling — Measurement of sputtered depth	50.00	71.040.40
ISO 16531:2013 Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS	95.99	71.040.40
ISO 16531:2020 Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS	60.60	71.040.40
ISO 17109:2015 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films	90.60	71.040.40
ISO/TR 22335:2007 Surface chemical analysis — Depth profiling — Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer	90.93	71.040.40
ISO/CD 23170 Surface Chemical Analysis --- Depth Profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering	30.20

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